The effect of the magnetron sputtering process parameters on the electrical properties of the amorphous carbon films

The effect of the use gas pressure, the distance between the target and substrate, the discharge current, the substrate temperature on the value of the electrical conductivity of the amorphous carbon films obtained by the magnetron sputtering method for the graphite target in an argon gas atmosphere were studied. It was found that the electrical conductivity of the film is effectively changed to a wide range by changing the substrate temperature, meanwhile the obtained films have different structural modification from diamond - like structure to graphite - like structure. (author)