Published June 2004 | Version v1
Journal article

Development of very large helicon plasma source

  • 1. Research Institute of Science and Technology, Tokai University, Shibuya-ku, Tokyo 151-8677 (Japan)
  • 2. Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-8580 (Japan)

Description

We have developed a very large volume, high-density helicon plasma source, 75 cm in diameter and 486 cm in axial length; full width at half maximum of the plasma density is up to ∼42 cm with good plasma uniformity along the z axis. By the use of a spiral antenna located just outside the end of the vacuum chamber through a quartz-glass window, plasma can be initiated with a very low value of radio frequency (rf) power (<1 W), and an electron density of more than 1012 cm-3 is successfully produced with less than several hundred Watt; achieving excellent discharge efficiency. It is possible to control the radial density profile in this device by changing the magnetic field configurations near the antenna and/or the antenna radiation-field patterns

Additional details

Identifiers

Publishing Information

Journal Title
Review of Scientific Instruments
Journal Volume
75
Journal Issue
6
Journal Page Range
p. 1941-1946
ISSN
0034-6748
CODEN
RSINAK

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
36030600
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
EFFICIENCY; ELECTRON DENSITY; MAGNETIC FIELD CONFIGURATIONS; PLASMA DENSITY; QUARTZ; RADIOWAVE RADIATION; RECTENNAS
Descriptors DEC
ANTENNAS; ELECTRICAL EQUIPMENT; ELECTROMAGNETIC RADIATION; EQUIPMENT; MINERALS; OXIDE MINERALS; RADIATIONS

Optional Information

Notes
(c) 2004 American Institute of Physics.