Published November 9, 2011
| Version v1
Journal article
Island growth in electrodeposition
- 1. IBM TJ Watson Research Center, Yorktown Heights, NY 10598 (United States)
- 2. Departamento de Física Aplicada, CINVESTAV-IPN, Mérida, Yucatan 97310 (Mexico)
- 3. IMEC VZW, Kapeldreef 75, 3001 Leuven (Belgium)
- 4. Department of Physics and Astronomy, Wayne State University, Detroit, MI 48202 (United States)
- 5. Department of Materials Science and Engineering, Johns Hopkins University, Baltimore, MD 21218 (United States)
Description
Electrochemical deposition of metals onto foreign substrates usually occurs through Volmer-Weber island growth. The mechanism of island nucleation and growth dictates the shape, orientation and number density of islands, and ultimately, the structure and properties of thin films. With increasing emphasis on deposition of ultrathin films and nanostructures, it is critically important to understand the kinetics of nucleation and growth. Here we provide a comprehensive review of island growth in electrodeposition and summarize methods for mechanistic analysis in both the kinetic and diffusion limited regimes. (topical review)
Availability note (English)
Available from http://dx.doi.org/10.1088/0022-3727/44/44/443001Additional details
Identifiers
- DOI
- 10.1088/0022-3727/44/44/443001;
- PII
- S0022-3727(11)97809-7;
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 44
- Journal Issue
- 44
- Journal Page Range
- [12 p.]
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43112024
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- DENSITY; DIFFUSION; ELECTRODEPOSITION; METALS; NANOSTRUCTURES; NUCLEATION; SUBSTRATES; THIN FILMS
- Descriptors DEC
- DEPOSITION; ELECTROLYSIS; ELEMENTS; FILMS; LYSIS; PHYSICAL PROPERTIES; SURFACE COATING