Published November 9, 2011 | Version v1
Journal article

Island growth in electrodeposition

  • 1. IBM TJ Watson Research Center, Yorktown Heights, NY 10598 (United States)
  • 2. Departamento de Física Aplicada, CINVESTAV-IPN, Mérida, Yucatan 97310 (Mexico)
  • 3. IMEC VZW, Kapeldreef 75, 3001 Leuven (Belgium)
  • 4. Department of Physics and Astronomy, Wayne State University, Detroit, MI 48202 (United States)
  • 5. Department of Materials Science and Engineering, Johns Hopkins University, Baltimore, MD 21218 (United States)

Description

Electrochemical deposition of metals onto foreign substrates usually occurs through Volmer-Weber island growth. The mechanism of island nucleation and growth dictates the shape, orientation and number density of islands, and ultimately, the structure and properties of thin films. With increasing emphasis on deposition of ultrathin films and nanostructures, it is critically important to understand the kinetics of nucleation and growth. Here we provide a comprehensive review of island growth in electrodeposition and summarize methods for mechanistic analysis in both the kinetic and diffusion limited regimes. (topical review)

Availability note (English)

Available from http://dx.doi.org/10.1088/0022-3727/44/44/443001

Additional details

Identifiers

DOI
10.1088/0022-3727/44/44/443001;
PII
S0022-3727(11)97809-7;

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
44
Journal Issue
44
Journal Page Range
[12 p.]
ISSN
0022-3727
CODEN
JPAPBE

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43112024
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
DENSITY; DIFFUSION; ELECTRODEPOSITION; METALS; NANOSTRUCTURES; NUCLEATION; SUBSTRATES; THIN FILMS
Descriptors DEC
DEPOSITION; ELECTROLYSIS; ELEMENTS; FILMS; LYSIS; PHYSICAL PROPERTIES; SURFACE COATING