Published February 28, 2003
| Version v1
Journal article
A simple method to grow textured (1 1 1) diamond thin films in a hot-filament CVD system
Creators
Description
A simple and new method for synthesizing (1 1 1)-textured diamond films in a hot-filament CVD reactor has been developed by adopting a lower-than-normal filament temperature pretreatment. The (1 1 1) facets are always dominant in the resulting diamond films using a low filament temperature range of 1300-1600 deg. C. This growth habit is insensitive to the change in deposition parameters, such as substrate temperature, methane concentration, and even addition of a small amount of nitrogen. High-quality and high-textured (1 1 1) diamond films can be easily achieved by a subsequent growth at a normal filament temperature of 2000 deg. C
Additional details
Identifiers
- DOI
- 10.1016/S0169-4332(02)01285-0;
- arXiv
- arXiv:hep-ph/9507342v1;
- PII
- S0169433202012850;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 207
- Journal Issue
- 1-4
- Journal Page Range
- p. 121-127
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38086340
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; DIAMONDS; FILAMENTS; METHANE; NITROGEN; TEMPERATURE RANGE 1000-4000 K; THIN FILMS
- Descriptors DEC
- ALKANES; CARBON; CHEMICAL COATING; DEPOSITION; ELEMENTS; FILMS; HYDROCARBONS; MINERALS; NONMETALS; ORGANIC COMPOUNDS; SURFACE COATING; TEMPERATURE RANGE
Optional Information
- Copyright
- Copyright (c) 2002 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.