Published February 28, 2003 | Version v1
Journal article

A simple method to grow textured (1 1 1) diamond thin films in a hot-filament CVD system

Description

A simple and new method for synthesizing (1 1 1)-textured diamond films in a hot-filament CVD reactor has been developed by adopting a lower-than-normal filament temperature pretreatment. The (1 1 1) facets are always dominant in the resulting diamond films using a low filament temperature range of 1300-1600 deg. C. This growth habit is insensitive to the change in deposition parameters, such as substrate temperature, methane concentration, and even addition of a small amount of nitrogen. High-quality and high-textured (1 1 1) diamond films can be easily achieved by a subsequent growth at a normal filament temperature of 2000 deg. C

Additional details

Identifiers

DOI
10.1016/S0169-4332(02)01285-0;
arXiv
arXiv:hep-ph/9507342v1;
PII
S0169433202012850;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
207
Journal Issue
1-4
Journal Page Range
p. 121-127
ISSN
0169-4332
CODEN
ASUSEE

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38086340
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
CHEMICAL VAPOR DEPOSITION; DIAMONDS; FILAMENTS; METHANE; NITROGEN; TEMPERATURE RANGE 1000-4000 K; THIN FILMS
Descriptors DEC
ALKANES; CARBON; CHEMICAL COATING; DEPOSITION; ELEMENTS; FILMS; HYDROCARBONS; MINERALS; NONMETALS; ORGANIC COMPOUNDS; SURFACE COATING; TEMPERATURE RANGE

Optional Information

Copyright
Copyright (c) 2002 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.