Published February 2008 | Version v1
Journal article

Mechanism of acceptor impurity initiation in the TiCoSb intermetallic semiconductor heavily doped with a V donor impurity. 1. Studies of the crystal structure and the distribution of the electron density of states

  • 1. Natsyional'nij unyiversitet 'L'vyivs'ka polyitekhnyika', L'vyiv (Ukraine)
  • 2. Yinstitut prikladnikh problem mekhanyiki ta matematiki, L'vyiv (Ukraine)
  • 3. L'vyivs'kij natsyional'nij Unyiversitet, L'vyiv (Ukraine)
  • 4. Yinstitut fyizichnoyi khyimyiyi unyiversitetu, Vyiden'(Australia)

Description

Structural characteristics of the TiCoSb intermetallic semiconductor heavily doped with a donor V impurity have been studied, and the corresponding electron density of states (DOS) has been calculated. The numerical simulation of the investigated physical phenomena has been demonstrated to describe them adequately, if the variable occupation numbers of the atomic lattice sites the elementary cell of the compound are taken into account while constructing a Wigner-Seitz cell

Additional details

Additional titles

Original title (Ukrainian)
Mekhanyizm generatsyiyi aktseptornoyi domyishki v yintermetalyichnomu napyivprovyidniku TiCoSb pri sil'nomu leguvannyi donornoyu domyishkoyu V. 1. Doslyidzhennya strukturi ta rozpodyilu shchyil'nostyi elektronnikh stanyiv

Publishing Information

Journal Title
Ukrayins'kij Fyizichnij Zhurnal (Kyiv)
Journal Volume
53
Journal Issue
no.2
Journal Page Range
p. 158-163
ISSN
0372-400X