Proton beam micromachining dose normalization for SU-8 using ionoluminescence detection
Description
Proton beam micromachining (PBM) allows the production of small, intricate, high aspect ratio structures with smooth sidewalls by direct writing MeV protons beams in resist materials such as SU-8 and PMMA. The process depends on the correct incident dose of protons, and conventional normalizing methods using RBS have been utilized previously. However for accelerated (sensitive) resists such as SU-8, the yield of backscattered ions, particularly for small structures, is insufficient for accurate dose measurement. We have used the more prolific ion induced photon emission from SU-8 as a dose normalizing signal for PBM. The SU-8 emits radiation at a wavelength of 560 nm under proton irradiation, and the yield per incident proton depends on the thickness of the resist layer. The photon yield per incident proton has a maximum value at a dose of 25 nC mm-2. The photon normalization method has been used to good effect to micromachine a complex shape with resulting good edge definition
Additional details
Identifiers
- PII
- S0168583X03010231;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 210
- Journal Issue
- 1
- Journal Page Range
- p. 256-259
- ISSN
- 0168-583X
- CODEN
- NIMBEU
Conference
- Title
- 8. international conference on nuclear microprobe technology and applications
- Dates
- 8-13 Sep 2002
- Place
- Takasaki (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 34077615
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BACKSCATTERING; IONS; IRRADIATION; LUMINESCENCE; MACHINING; MEV RANGE; PHOTON EMISSION; PHOTONS; PHYSICAL RADIATION EFFECTS; PMMA; PROTON BEAMS; SHIELDING MATERIALS; THICKNESS; WAVELENGTHS
- Descriptors DEC
- BEAMS; BOSONS; CHARGED PARTICLES; DIMENSIONS; ELEMENTARY PARTICLES; EMISSION; ENERGY RANGE; ESTERS; MASSLESS PARTICLES; MATERIALS; NUCLEON BEAMS; ORGANIC COMPOUNDS; ORGANIC POLYMERS; PARTICLE BEAMS; PHOTON EMISSION; POLYACRYLATES; POLYMERS; POLYVINYLS; RADIATION EFFECTS; SCATTERING
Optional Information
- Copyright
- Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.