Published May 2018 | Version v1
Journal article

Corrosion resistance mechanism of palladium film-plated stainless steel in boiling H2SO4 solution

  • 1. State Key Laboratory of Oil and Gas Reservoir Geology and Exploitation, Southwest Petroleum University, Chengdu 610500 (China)
  • 2. School of Chemistry and Chemical Engineering, Southwest Petroleum University, Chengdu 610500 (China)
  • 3. Shanghai Aerospace Equipment Manufacture Co. Ltd., Shanghai 200245 (China)
  • 4. School of Material Science and Engineering, Beijing University of Chemical Technology, Beijing 100029 (China)

Description

Highlights: • The anti-corrosion mechanism of Pd film-plated stainless steel was investigated. • A definition of critical area ratio was given to evaluate the noble metal films/passive substrates galvanic systems. • A model for describing the corrosion degradation process of Pd film-plated stainless steel was established. - Abstract: The protection mechanism and corrosion behavior of the Pd film-plated stainless steel in a boiling H2SO4 solution were investigated in this paper. Potentiodynamic measurements, galvanic corrosion tests, electrochemical impedance spectroscopy and X-ray photoelectron spectroscopy were conducted to study the electrochemical modification effect of the Pd film on the passivation of stainless steel substrate. The results showed that the Pd film mainly influenced the cathodic process of corrosion. The corrosion potential of the Pd-plated stainless steel was determined by the cathode/anode area ratio. The degradation process of Pd film-plated stainless steel included three stages: stable passivation, slow corrosion and accelerated corrosion.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.corsci.2018.02.055

Additional details

Identifiers

DOI
10.1016/j.corsci.2018.02.055;
PII
S0010938X17317845;

Publishing Information

Journal Title
Corrosion Science
Journal Volume
135
Journal Page Range
p. 222-232
ISSN
0010-938X
CODEN
CRRSAA

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.