Design and fabrication of an InP arrayed waveguide grating for monolithic PICs

A 10-channel, 200 GHz channel spacing InP arrayed waveguide grating was designed, and the deep ridge waveguide design makes it polarization independent. Under the technologies of molecular beam epitaxy, lithography, and induced coupler plasma etching, the chip was fabricated in our laboratory. The test results show that the insertion loss is about −8 dB, and the crosstalk is less than −17 dB. (semiconductor devices)