An important atomic process in the CVD growth of graphene: Sinking and up-floating of carbon atom on copper surface
Creators
- 1. State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, North China Electric Power University, Beijing, 102206 (China)
- 2. Su Zhou Institute, North China Electric Power University, Suzhou, 215123 (China)
- 3. School of Materials Science and Engineering, Harbin Institute of Technology, Harbin, 150001 (China)
- 4. Department of Chemical Engineering, Tsinghua University, Beijing, 100084 (China)
Description
By density functional theory (DFT) calculations, the early stages of the growth of graphene on copper (1 1 1) surface are investigated. At the very first time of graphene growth, the carbon atom sinks into subsurface. As more carbon atoms are adsorbed nearby the site, the sunken carbon atom will spontaneously form a dimer with one of the newly adsorbed carbon atoms, and the formed dimer will up-float on the top of the surface. We emphasize the role of the co-operative relaxation of the co-adsorbed carbon atoms in facilitating the sinking and up-floating of carbon atoms. In detail: when two carbon atoms are co-adsorbed, their co-operative relaxation will result in different carbon–copper interactions for the co-adsorbed carbon atoms. This difference facilitates the sinking of a single carbon atom into the subsurface. As a third carbon atom is co-adsorbed nearby, it draws the sunken carbon atom on top of the surface, forming a dimer. Co-operative relaxations of the surface involving all adsorbed carbon atoms and their copper neighbors facilitate these sinking and up-floating processes. This investigation is helpful for the deeper understanding of graphene synthesis and the choosing of optimal carbon sources or process.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2013.07.081Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2013.07.081;
- PII
- S0169-4332(13)01392-5;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 284
- Journal Page Range
- p. 207-213
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46003721
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ATOMS; CARBON SOURCES; CHEMICAL VAPOR DEPOSITION; COPPER; CRYSTAL GROWTH; DENSITY FUNCTIONAL METHOD; DIMERS; GRAPHENE; INTERACTIONS; NANOSTRUCTURES; RELAXATION; SURFACES; SYNTHESIS
- Descriptors DEC
- CALCULATION METHODS; CARBON; CHEMICAL COATING; DEPOSITION; ELEMENTS; METALS; NONMETALS; SURFACE COATING; TRANSITION ELEMENTS; VARIATIONAL METHODS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.