Published November 1, 2013 | Version v1
Journal article

An important atomic process in the CVD growth of graphene: Sinking and up-floating of carbon atom on copper surface

  • 1. State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, North China Electric Power University, Beijing, 102206 (China)
  • 2. Su Zhou Institute, North China Electric Power University, Suzhou, 215123 (China)
  • 3. School of Materials Science and Engineering, Harbin Institute of Technology, Harbin, 150001 (China)
  • 4. Department of Chemical Engineering, Tsinghua University, Beijing, 100084 (China)

Description

By density functional theory (DFT) calculations, the early stages of the growth of graphene on copper (1 1 1) surface are investigated. At the very first time of graphene growth, the carbon atom sinks into subsurface. As more carbon atoms are adsorbed nearby the site, the sunken carbon atom will spontaneously form a dimer with one of the newly adsorbed carbon atoms, and the formed dimer will up-float on the top of the surface. We emphasize the role of the co-operative relaxation of the co-adsorbed carbon atoms in facilitating the sinking and up-floating of carbon atoms. In detail: when two carbon atoms are co-adsorbed, their co-operative relaxation will result in different carbon–copper interactions for the co-adsorbed carbon atoms. This difference facilitates the sinking of a single carbon atom into the subsurface. As a third carbon atom is co-adsorbed nearby, it draws the sunken carbon atom on top of the surface, forming a dimer. Co-operative relaxations of the surface involving all adsorbed carbon atoms and their copper neighbors facilitate these sinking and up-floating processes. This investigation is helpful for the deeper understanding of graphene synthesis and the choosing of optimal carbon sources or process.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2013.07.081

Additional details

Identifiers

DOI
10.1016/j.apsusc.2013.07.081;
PII
S0169-4332(13)01392-5;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
284
Journal Page Range
p. 207-213
ISSN
0169-4332
CODEN
ASUSEE

INIS

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.