Ultrafast imaging of transient electronic plasmas produced in conditions of femtosecond waveguide writing in dielectrics
Creators
- 1. Laser Processing Group, Instituto de Optica, C.S.I.C., Serrano 121, 28006 Madrid (Spain)
Description
Femtosecond laser-induced plasmas in bulk dielectrics are imaged under waveguide writing conditions, for different polarizations, pulse durations, and processing depths, and their temporal evolution is measured using ultrafast pump-probe microscopy. The irradiation beam profile is elliptically shaped yielding a disklike focal volume. We demonstrate for doped phosphate glass that increasing the pulse duration improves the spatial distribution of deposited energy by minimizing beam filamentation and prefocal depletion effects. As a consequence, energy deposition in the desired volume is greatly enhanced. Our results identify key parameters for optimizing femtosecond laser processing of dielectrics and different strategies to minimize energy loss channels
Additional details
Identifiers
- DOI
- 10.1063/1.2988275;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 93
- Journal Issue
- 12
- Journal Page Range
- p. 121109-121109.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40050979
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- BEAM PROFILES; DIELECTRIC MATERIALS; DOPED MATERIALS; ENERGY LOSSES; LASERS; OPTICAL MICROSCOPY; OPTIMIZATION; PHOSPHATE GLASS; PLASMA; PLASMA DIAGNOSTICS; PLASMA PRODUCTION; POLARIZATION; PULSES; SPATIAL DISTRIBUTION; WAVEGUIDES
- Descriptors DEC
- DISTRIBUTION; GLASS; LOSSES; MATERIALS; MICROSCOPY
Optional Information
- Notes
- (c) 2008 American Institute of Physics