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Published November 2019 | Version v1
Journal article

Impact of Post-Deposition Recrystallization by Alkali Fluorides on Cu(In,Ga)Se2Thin-Film Materials and Solar Cells

  • 1. Virginia Institute of Photovoltaics, Old Dominion University, Norfolk, VA (United States)
  • 2. Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, CO (United States)

Description

Highlights: • Cu (In,Ga)Se2 layers are recrystallized using a variety of alkali fluorides. • Efficiency of device was doubled for samples recrystallized with NaF. • Observed disappearance of rollover and shunt from the J-V curves -- Abstract: Using thermal evaporation, Cu(In,Ga)Se2 (CIGS) layers were deposited at low temperature (350 °C) and high rate (10 μm/h) using a single stage process. They were then recrystallized using a variety of alkali fluorides: NaF, KF, RbF and CsF. To ensure that the substrate would not influence the study (via alkali diffusion), the samples were deposited on silicon wafers. The chemical, physical and electrical properties of the films were then characterized, demonstrating that all alkali fluorides behave as fluxing agents to enhance recrystallization and conductivity, and induce a (112) preferential orientation. Secondary ion mass spectrometry analysis showed that no modification of the elements' distribution occurs because of recrystallization. Solar cells were also fabricated and characterized, indicating that NaF can double the efficiency of solar cells compared to the as-deposited layers. This enhancement is accompanied by the disappearance of a rollover, voltage dependent current collection and shunt from the current density-voltage curves. However, even for the best recrystallization, the current is still limited to 28 mA/cm2, indicating that only a portion (0.75 μm) of the full device (2 μm) is activated.

Additional details

Identifiers

DOI
10.1016/j.tsf.2019.137526;
PII
S0040609019305541;

Publishing Information

Journal Title
Thin Solid Films (Print)
Journal Volume
690
Journal Page Range
vp.
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2019 Elsevier B.V. All rights reserved.