Published December 2000 | Version v1
Book

Influence of neutron radiation on biased MOS structures

  • 1. Dept. of Electrical Engineering, Indian Institute of Technology, Mumbai (India)
  • 2. Solid State Physics Div., Bhabha Atomic Research Centre, Mumbai (India)

Description

It has been reported that neutrons can produce electronic damage in the gate oxides of MOS devices. In this work an attempt has been made to verify the same and therefore this work presents ionisation damage seen in MOS structures due to neutrons alone after accounting for the effects of associated gamma rays from neutron radiation process

Part of:
International symposium on nuclear physics. V. 43B

Additional details

Publishing Information

Publisher
Bhabha Atomic Research Centre
Imprint Place
Mumbai (India)
Imprint Title
International symposium on nuclear physics. V. 43B
Imprint Pagination
605 p.
Journal Page Range
p. 554-555

Conference

Title
International symposium on nuclear physics
Dates
18-22 Dec 2000
Place
Mumbai (India)

Optional Information

Notes
5 refs., 4 figs.