Published October 1, 2010 | Version v1
Journal article

Effect of nitrogen flow rate on properties of nanostructured TiZrN thin films produced by radio frequency magnetron sputtering

  • 1. Department of Engineering and System Science National Tsing Hua University, 101 Kuang Fu Rd., Sec. 2, Hsinchu 300, Taiwan (China)
  • 2. Instrument Technology Research Center, 20 R and D Road VI, Hsinchu Science-Based Industrial Park, Hsinchu 300, Taiwan (China)
  • 3. Institute of Nuclear Engineering and Science National Tsing Hua University, 101 Kuang Fu Rd., Sec. 2, Hsinchu 300, Taiwan (China)

Description

The effect of nitrogen flow rate on structure and properties of (Ti,Zr)N thin films was investigated in the study. Two types of (Ti,Zr)N thin films were found with different nitrogen flow rates, one is the single-phase solid solution of (Ti,Zr)N that appeared for nitrogen flow rates of 2-7 sccm, the other one is the phase of both (Ti,Zr)N and TiZr mixture for the lower nitrogen flow rates of 1 sccm. The grain size of the films was also determined by X-ray diffraction, and the size was less than 20 nm. The (Ti,Zr)N films show excellent hardness ranging from 35.5 to 37.5 GPa with exhibiting (111) preferred orientation.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2010.04.099

Additional details

Identifiers

DOI
10.1016/j.tsf.2010.04.099;
PII
S0040-6090(10)00632-2;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
518
Journal Issue
24
Journal Page Range
p. 7308-7311
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
Taiwan Association for Coatings and Thin Films Technology international thin films conference
Acronym
TACT 2009
Dates
14-16 Dec 2009
Place
Taipei, Taiwan (China)

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.