Published 1992 | Version v1
Miscellaneous Metadata-only

Effect of the addition of boron on the sputtering yield of nickel

Creators

  • 1. Academia Sinica, SH (China). Shanghai Inst. of Nuclear Research

Description

no abstract available

Additional details

Publishing Information

Imprint Title
Laboratory of nuclear analysis techniques academia sinica annual report (1992)
Imprint Pagination
167 p.
Journal Page Range
p. 40

INIS

Country of Publication
China
Country of Input or Organization
China
INIS RN
29057964
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Non-conventional Literature, No Abstract
Descriptors DEI
ARGON IONS; BACKSCATTERING; BORON ADDITIONS; KEV RANGE 10-100; NICKEL; RUTHERFORD SCATTERING; SCANNING ELECTRON MICROSCOPY; SPUTTERING; YIELDS
Descriptors DEC
CHARGED PARTICLES; ELASTIC SCATTERING; ELECTRON MICROSCOPY; ELEMENTS; ENERGY RANGE; IONS; KEV RANGE; METALS; MICROSCOPY; SCATTERING; TRANSITION ELEMENTS