Published April 1988
| Version v1
Journal article
The experimental sputtering angular distribution of Cu-Au alloy with 27 keV oblique incident Ar+ ion beam
- 1. Academia Sinica, Shanghai, SH (China). Shanghai Inst. of Nuclear Research
- 2. Academia Sinica, Shanghai SH (China). Shanghai Inst. of Metallurgy
Description
The angular distributions of sputtered Cu and Au atoms have been measured under normal and oblique incidence bombardment with 27 keV Ar+ for Cu-Au (30 wt%) alloy. Sputtering material on Al collector has been analysed by RBS technique. The resuts indicate that copper atoms are ejected preferentially under oblique incidence bombardment (θT = 40 deg) and the preferential ratio for oblique incidence is higher than that for normal incidence (θT = 0 deg). From the angular distributions of sputtered copper atoms the ejection probability in the ejected angle region between 0 deg and 45 deg for oblique incidence is found to be lower than that for normal incidence
Additional details
Publishing Information
- Journal Title
- Nuclear Techniques
- Journal Volume
- 11
- Journal Issue
- 4
- Series
- Nucl. Tech.
- Journal Page Range
- 13-16
- ISSN
- 0253-3219
- CODEN
- NUTED
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 20038789
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANGULAR DISTRIBUTION; ARGON IONS; BACKSCATTERING; COPPER ALLOYS; GOLD ALLOYS; INCIDENCE ANGLE; KEV RANGE 10-100; RUTHERFORD SCATTERING; SPUTTERING
- Descriptors DEC
- ALLOYS; CHARGED PARTICLES; DISTRIBUTION; ELASTIC SCATTERING; ENERGY RANGE; IONS; KEV RANGE; SCATTERING