Published October 2000 | Version v1
Journal article Metadata-only

A study on process, structure and characteristics of TiN thick film prepared by MBMI technology

Creators

  • 1. Dalian Univ. of Technology, Dalian (China). The State Key Laboratory for Material Modification by Three Beams

Description

TiN thick films were prepared by multi-ion-beam dynamic mixing implanting (MBMI) technology and their structure and characteristics were analyzed by XRD, microhardness analysis and scratch test. The structure analysis results indicate that the phase structure of TiN films are affected by the implantation angle of nitrogen ion, the nitrogen to titanium atom ratio and the pressure of nitrogen gas. The performance tests show that higher temperature of substrate Ts and suitable RN/Ti are important for increasing the microhardness (HK) of TiN films and the stickiness between TiN film and substrate

Additional details

Publishing Information

Journal Title
Nuclear Techniques
Journal Volume
23
Journal Issue
10
Journal Page Range
p. 678-682
ISSN
0253-3219

INIS

Country of Publication
China
Country of Input or Organization
China
INIS RN
32018528
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
DEPOSITION; FILMS; ION BEAMS; ION IMPLANTATION; MICROHARDNESS; MIXING; NITROGEN; PERFORMANCE; TITANIUM NITRIDES
Descriptors DEC
BEAMS; ELEMENTS; HARDNESS; MECHANICAL PROPERTIES; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS