Published May 25, 2016 | Version v1
Journal article

Temperature and field dependent magnetization in a sub- μ m patterned Co/FeRh film studied by resonant x-ray scattering

  • 1. Sorbonne Universités, UPMC Univ Paris 06, CNRS UMR 7588, Institut des NanoSciences de Paris, 75005 Paris (France)
  • 2. ELETTRA – Sincrotrone Trieste, Area Science Park, 34149 Trieste (Italy)
  • 3. Sorbonne Universités, UPMC Univ Paris 06, CNRS UMR 7614, Laboratoire de Chimie Physique Matière et Rayonnement, 75005 Paris (France)
  • 4. Université Paris-Sud, CNRS UMR 8609, Centre de Sciences Nucléaires et de Sciences de la Matière, Bât. 104–108, 91405 Orsay (France)
  • 5. Fakultät für Physik, University of Regensburg, 93053 Regensburg (Germany)
  • 6. Synchrotron SOLEIL, L'Orme des Merisiers, Saint-Aubin, B.P. 48, 91192 Gif-sur-Yvette (France)

Description

We studied the temperature and field dependence of the magnetization in a Co/FeRh/MgO(0 0 1) film patterned into a matrix of sub- μ m sized rectangles, using element selective resonant scattering of polarized soft x-rays. We show that it is possible to reverse partially the magnetization of the Co layer in a thermal cycle that crosses the FeRh antiferromagnetic to ferromagnetic transition. Our results support interest in patterned Co/FeRh films and their potential for achieving temperature induced magnetization switching. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0022-3727/49/20/205003

Additional details

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
49
Journal Issue
20
Journal Page Range
[7 p.]
ISSN
0022-3727
CODEN
JPAPBE