Published 2006
| Version v1
Journal article
Ion Energy and Angular Distribution in RF Capacitively Coupled Plasma Sources
Creators
- 1. NSC 'Kharkov Institute of Physics and Technology', Kharkov (Ukraine)
Description
The possibility to control ion energy distribution function (IEDFs) and ion angle distribution functions (IADFs) on electrodes in single- and dual frequency capacitively coupled plasma (CCP) sources are investigated by means of particle-in-cell/Monte Carlo (PIC/MCC) simulations. It is shown that the IEDFs can be controlled by the driven voltage and frequency in single frequency capacitive discharges. It is demonstrated that the IEDFs and IADFs can be controlled by the low frequency voltage in dualfrequency CCP sources
Additional details
Publishing Information
- Journal Title
- Voprosy Atomnoj Nauki i Tekhniki
- Journal Issue
- no.5/5
- Journal Page Range
- p. 116-121
- ISSN
- 1562-6016
INIS
- Country of Publication
- Ukraine
- Country of Input or Organization
- Ukraine
- INIS RN
- 38085072
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ANGULAR DISTRIBUTION; COMPUTERIZED SIMULATION; DISTRIBUTION FUNCTIONS; ELECTRIC DISCHARGES; ENERGY SPECTRA; IONS; MONTE CARLO METHOD; PLASMA DENSITY; PLASMA PRODUCTION
- Descriptors DEC
- CALCULATION METHODS; CHARGED PARTICLES; DISTRIBUTION; FUNCTIONS; SIMULATION; SPECTRA