H-TALIF measurement for wall radical quenching modelling in microscale combustion

Two-dimensional hydrogen atom (H) distribution in a CH₄/air premixed flame in a narrow channel was measured using a newly-developed two-photon absorption LIF (TALIF) setup with high efficiency 205 nm laser. The wall chemical effect of SUS321 and quartz surfaces on the H distribution in a methane flame was examined. Based on the measured H atom concentration near the wall, a radical quenching model focused on the H adsorption is proposed and the initial sticking coefficient (S ₀) of H on SUS321 and quartz surfaces are estimated as 0.1 and 0.01, respectively. Sensitivity analysis of CO, HRR and species distributions with varying S ₀ of H, O, OH, CH₃ were performed. It is found that the H adsorption should be dominant in the wall chemical effect on the methane flame. (paper)