Effects of chemical etching with nitric acid on glass surfaces
Creators
- 1. Photonics Research Center, Korea Institute of Science and Technology, Seoul 130-650 (Korea, Republic of)
- 2. Research and Development Department, Advanced Lab Solution, Seoul 120-140 (Korea, Republic of)
- 3. Atomic-scale Surface Science Research Center and Department of Physics, Yonsei University, Seoul 120-749 (Korea, Republic of)
Description
Glass slides were chemically etched with nitric acid using five different methods. We investigated the effects of chemical etching treatments on such properties as chemical composition, surface roughness, transmittance, and thermal stability of the glass. Sodium, calcium, and aluminum atoms in the surface of the glass are effectively reduced by chemical etching with nitric acid. Especially, boiling the glass in a 70% nitric acid solution for 30 min is more effective in the reduction of sodium, calcium, and aluminum atoms at the surface of the glass than other etching methods with nitric acid. The surface morphologies of the glasses were very similar regardless of the chemical etching treatments with nitric acid etchant. Root-mean-square surface roughness of the bare glass was 0.58 nm but that of the glass etched with nitric acid was ranged from 5.4 to 6.8 nm. Sodium concentration at the glass surface was largely reduced from 2.44% to 0.25%. In order to investigate the thermal stability of the glass, the bare glass and the glass samples boiled for 30 min in a 70% HNO3 solution were annealed in air at 300, 400, 500, and 600 deg. C for 1 h. Sodium, aluminum, and calcium at the surface of the glass increased with an annealing temperature regardless of chemical etching with nitric acid, but the Na, Al, and Ca content at the surface of the glass boiled in 70% HNO3 for 30 min was greatly reduced relative to that of the surface of the bare glass at an annealing temperature of 500 deg. C
Additional details
Identifiers
- DOI
- 10.1116/1.1333087;
Publishing Information
- Journal Title
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
- Journal Volume
- 19
- Journal Issue
- 1
- Journal Page Range
- p. 267-274
- ISSN
- 0734-2101
- CODEN
- JVTAD6
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 35031867
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Numerical Data
- Descriptors DEI
- ALUMINIUM; ALUMINIUM SILICATES; CALCIUM; ETCHING; EXPERIMENTAL DATA; MORPHOLOGY; NITRIC ACID; SODIUM; SURFACE PROPERTIES; SURFACE TREATMENTS; SURFACES
- Descriptors DEC
- ALKALI METALS; ALKALINE EARTH METALS; ALUMINIUM COMPOUNDS; DATA; ELEMENTS; HYDROGEN COMPOUNDS; INFORMATION; INORGANIC ACIDS; INORGANIC COMPOUNDS; METALS; NITROGEN COMPOUNDS; NUMERICAL DATA; OXYGEN COMPOUNDS; SILICATES; SILICON COMPOUNDS; SURFACE FINISHING
Optional Information
- Notes
- (c) 2001 American Vacuum Society.