An ion beam transport design optimization in a medium range ion implanter system

An improvement of the transport beam focusing model in an ion implanter system has been achieved, with the definition of the main optical elements used and their parameters effect on charged particles. The equations of motion of charged particles and matrices in each optical element have been derived, with consideration of the motion in different planes. In the first assumption, the four-dimensional beam ellipsoid, the beam transport is accomplished in zero order (drift space and dipole) and first order (quadrupole and magnet). In the second assumption, the particle distribution is normal in the area of its space coordinates. Calculations of the emittance and brightness factors of the ion beam are found to be more affected by the energy of charged particles. The emittance and brightness have constant normalized values. A comparison and evaluation was made of the location and the effect of the designed parameters for each optical element within the available ion implantation design system. (author)