Published January 8, 2014 | Version v1
Journal article

Standing wave effect on plasma distribution in an inductively coupled plasma source with a short antenna

  • 1. Department of Energy Systems Engineering, Seoul National University, Seoul 151–744 (Korea, Republic of)
  • 2. Mechatronics and Manufacturing Technology Center, Samsung Electronics Co. Ltd., Gyeonggi-Do 443–742 (Korea, Republic of)

Description

The effect of a standing wave on plasma density is observed in an inductively coupled plasma (ICP) with a single turn antenna whose circumferential length is much shorter than the wavelength of the driving frequency. The experiment is performed in an argon plasma operated at 5 mTorr with 13.56 MHz power applied to the single turn antenna with diameter of 300 mm. Measured plasma density near the ground termination of the antenna is higher than near the power input, which degrades the uniformity in the ICP source. It is analysed with the standing wave effect of the current and voltage on the antenna, which is carried out with a transmission line model based on the transformer circuit model of the ICP. The wavelength and the distribution of the inductively and capacitively coupled powers along the antenna are obtained from the model with the measured impedance of the antenna. The expected density distribution agrees well with the measured one, revealing that the wavelength is shortened and the nonuniformity of the plasma density becomes severe with increase of the input power. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0022-3727/47/1/015205

Additional details

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
47
Journal Issue
1
Journal Page Range
[6 p.]
ISSN
0022-3727
CODEN
JPAPBE

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46035451
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
ANTENNAS; ARGON; CURRENTS; ELECTRIC POTENTIAL; IMPEDANCE; MHZ RANGE; PLASMA DENSITY; PLASMA SIMULATION; POWER INPUT; STANDING WAVES; WAVELENGTHS
Descriptors DEC
ELECTRICAL EQUIPMENT; ELEMENTS; EQUIPMENT; FLUIDS; FREQUENCY RANGE; GASES; NONMETALS; RARE GASES; SIMULATION