Published October 31, 2011 | Version v1
Journal article

Humid environment stability of low pressure chemical vapor deposited boron doped zinc oxide used as transparent electrodes in thin film silicon solar cells

  • 1. Institute of Microtechnology (IMT), University of Neuchatel, CH-2000 Neuchatel (Switzerland)
  • 2. Oerlikon Solar-Lab, 2000 Neuchatel (Switzerland)

Description

The stability in humid environment of low pressure chemical vapor deposited boron doped zinc oxide (LPCVD ZnO:B) used as transparent conductive oxide in thin film silicon solar cells is investigated. Damp heat treatment (exposure to humid and hot atmosphere) induces a degradation of the electrical properties of unprotected LPCVD ZnO:B layers. By combining analyses of the electrical and optical properties of the films, we are able to attribute this behavior to an increase of electron grain boundary scattering. This is in contrast to the intragrain scattering mechanisms, which are not affected by damp heat exposure. The ZnO stability is enhanced for heavily doped films due to easier tunneling through potential barrier at grain boundaries.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2011.06.095

Additional details

Identifiers

DOI
10.1016/j.tsf.2011.06.095;
PII
S0040-6090(11)01372-1;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
520
Journal Issue
1
Journal Page Range
p. 558-562
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.