Published June 2019 | Version v1
Journal article

Degradation Test for an Anodic Aluminum Oxide Film in Plasma Etching

  • 1. Hanyang University, Seoul (Korea, Republic of)
  • 2. Korea Research Institute of Standards and Science, Daejeon (Korea, Republic of)

Description

A reliability assessment was performed to predict the lifetime of an anodic aluminum oxide film coated on equipment used in plasma etching processes. An anodic aluminum-oxide-coated part was exposed to an argon plasma, and its weight loss was monitored. This plasma test was conducted at four different pressure levels (125, 150, 200, and 250 mTorr). The failure distribution data obtained for each pressure level were found to indicate the same failure mechanism. Subsequently, an inverse power model was the best fit model for describing the relationship between the applied pressure and the lifetime of a part. The failure of the anodic aluminum oxide film caused by long-term exposure to plasma is, thus, shown to be closely linked to a decrease in the weight of the film.

Additional details

Publishing Information

Journal Title
Journal of the Korean Physical Society
Journal Volume
74
Journal Issue
11
Series
14 refs, 7 figs, 4 tabs
Journal Page Range
p. 1046-1051
ISSN
0374-4884

INIS

Country of Publication
Korea, Republic of
Country of Input or Organization
Korea, Republic of
INIS RN
50066792
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
ALUMINIUM OXIDES; ETCHING; FAILURES; LIFETIME; MONITORS; PERFORMANCE; PLASMA; RELIABILITY
Descriptors DEC
ALUMINIUM COMPOUNDS; CHALCOGENIDES; MEASURING INSTRUMENTS; OXIDES; OXYGEN COMPOUNDS; SURFACE FINISHING