Degradation Test for an Anodic Aluminum Oxide Film in Plasma Etching
Creators
- 1. Hanyang University, Seoul (Korea, Republic of)
- 2. Korea Research Institute of Standards and Science, Daejeon (Korea, Republic of)
Description
A reliability assessment was performed to predict the lifetime of an anodic aluminum oxide film coated on equipment used in plasma etching processes. An anodic aluminum-oxide-coated part was exposed to an argon plasma, and its weight loss was monitored. This plasma test was conducted at four different pressure levels (125, 150, 200, and 250 mTorr). The failure distribution data obtained for each pressure level were found to indicate the same failure mechanism. Subsequently, an inverse power model was the best fit model for describing the relationship between the applied pressure and the lifetime of a part. The failure of the anodic aluminum oxide film caused by long-term exposure to plasma is, thus, shown to be closely linked to a decrease in the weight of the film.
Additional details
Publishing Information
- Journal Title
- Journal of the Korean Physical Society
- Journal Volume
- 74
- Journal Issue
- 11
- Series
- 14 refs, 7 figs, 4 tabs
- Journal Page Range
- p. 1046-1051
- ISSN
- 0374-4884
INIS
- Country of Publication
- Korea, Republic of
- Country of Input or Organization
- Korea, Republic of
- INIS RN
- 50066792
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ALUMINIUM OXIDES; ETCHING; FAILURES; LIFETIME; MONITORS; PERFORMANCE; PLASMA; RELIABILITY
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; MEASURING INSTRUMENTS; OXIDES; OXYGEN COMPOUNDS; SURFACE FINISHING