Published 1977
| Version v1
Book
Combined transmission electron microscope and ion channeling study of metastable metal alloys formed by ion implantation
- 1. Royal Radar Establishment, Malvern (UK)
Description
Ion implantation has been used to produce metastable metal layers with unique physical properties. This paper describes its application to the formation of alloy layers in the Ag-Cu and Ta-Cu systems by implanting high doses of either 1 MeV-Ag+ ions or 150 keV-Ta+ ions into either electropolished [110] Cu single crystals or thick films of polycrystalline Cu. After implantation the layers were examined by 4He+ ion channeling. Structural studies were also carried out in a transmission electron microscope. Results are presented and discussed. (U.K.)
Additional details
Publishing Information
- Publisher
- Institute of Physics.
- Imprint Place
- Bristol
- ISBN
- 0 85498 127 6
- Imprint Title
- Developments in electron microscopy and analysis, 1977. Proceedings of the Institute of Physics Electron Microscopy and Analysis Group conference held in Glasgow, 12-14 September 1977 (EMAG 77)
- Journal Issue
- no. 36
- Series
- Institute of Physics Conference Series.
- Journal Page Range
- p. 181-184.
- ISSN
- 0305-2346
Conference
- Title
- Institute of Physics Electron Microscopy and Analysis Group conference on developments in electron microscopy and analysis, 1977.
- Dates
- 12 - 14 Sep 1977.
- Place
- Glasgow, UK.
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 9412716
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COPPER; COPPER ALLOYS; ELECTRON MICROSCOPY; HELIUM 4 BEAMS; ION CHANNELING; ION IMPLANTATION; SILVER ALLOYS; SILVER IONS; TANTALUM ALLOYS; TANTALUM IONS
- Descriptors DEC
- ALLOYS; ATOMIC IONS; BEAMS; CHANNELING; CHARGED PARTICLES; ELEMENTS; ION BEAMS; IONS; METALS; MICROSCOPY; TRANSITION ELEMENT ALLOYS; TRANSITION ELEMENTS