Published August 10, 2009
| Version v1
Journal article
Impact energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation
- 1. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon (Hong Kong)
- 2. Department 702, School of Mechanical and Automation Engineering, Beijing University of Aeronautics and Astronautics, Beijing 100191 (China)
Description
The implantation energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation (EGD-PIII) is investigated numerically and experimentally. Depth profiles obtained from different samples processed by EGD-PIII and traditional PIII are compared. The retained doses under different pulse widths are calculated by integrating the area under the depth profiles. Our results indicate that the improvement in the impact energy and retained dose uniformity by this technique is remarkable.
Additional details
Identifiers
- DOI
- 10.1063/1.3204697;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 95
- Journal Issue
- 6
- Journal Page Range
- p. 061503-061503.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41040292
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- GLOW DISCHARGES; ION IMPLANTATION; PLASMA; PULSES
- Descriptors DEC
- ELECTRIC DISCHARGES
Optional Information
- Notes
- (c) 2009 American Institute of Physics