Single In x Ga1− x As nanowire/p-Si heterojunction based nano-rectifier diode
- 1. Materials Science Centre, Indian Institute of Technology, Kharagpur, 721302 (India)
- 2. Center for Research in Nanoscience and Nanotechnology, University of Calcutta, Kolkata, 700098 (India)
Description
Nanoscale power supply units will be indispensable for fabricating next generation smart nanoelectronic integrated circuits. Fabrication of nanoscale rectifier circuits on a Si platform is required for integrating nanoelectronic devices with on-chip power supply units. In the present study, a nanorectifier diode based on a single standalone In x Ga1− x As nanowire/p-Si (111) heterojunction fabricated by metal organic chemical vapor deposition technique has been studied. The nanoheterojunction diodes have shown good rectification and fast switching characteristics. The rectification characteristics of the nanoheterojunction have been demonstrated by different standard waveforms of sinusoidal, square, sawtooth and triangular for two different frequencies of 1 and 0.1 Hz. Reverse recovery time of around 150 ms has been observed in all wave response. A half wave rectifier circuit with a simple capacitor filter has been assembled with this nanoheterojunction diode which provides 12% output efficiency. The transport of carriers through the heterojunction is investigated. The interface states density of the nanoheterojunction has also been determined. Occurrence of output waveforms incommensurate with the input is attributed to higher series resistance of the diode which is further explained considering the dimension of p-side and n-side of the junction. The sudden change of ideality factor after 1.7 V bias is attributed to recombination through interface states in space charge region. Low interface states density as well as high rectification ratio makes this heterojunction diode a promising candidate for future nanoscale electronics. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1361-6528/aa7f19Additional details
Identifiers
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 28
- Journal Issue
- 38
- Journal Page Range
- [11 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 50042899
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ARSENIC COMPOUNDS; CHEMICAL VAPOR DEPOSITION; EFFICIENCY; ELECTRIC CONTACTS; FILTERS; GALLIUM COMPOUNDS; HETEROJUNCTIONS; INDIUM COMPOUNDS; INTERFACES; NANOELECTRONICS; NANOWIRES; ORGANOMETALLIC COMPOUNDS; RECOMBINATION; WAVE FORMS
- Descriptors DEC
- CHEMICAL COATING; DEPOSITION; ELECTRICAL EQUIPMENT; EQUIPMENT; NANOSTRUCTURES; ORGANIC COMPOUNDS; SEMICONDUCTOR JUNCTIONS; SURFACE COATING