Chemical and electrochemical properties of ion-implanted metals

The effects of high dose ion implantations of various elements on the chemical and electrochemical properties of metals studied at RIKEN over the past 15 years are summarized in this paper. Distribution of the implanted atoms and chemical composition introduced by the ion implantation have been analyzed by some surface-analytical methods. The formation conditions of the unique substances synthesized by the ion implantation have been investigated. The chemical or electrochemical reactivity of the modified layers has been evaluated by a voltammetric method. It has been found that the implantation of ions, such as Cr+, Ti+ and C+, with high fluences is effective in suppressing the anodic dissolution of iron. The suppression mechanisms related to the formation of the stable or metastable alloys or compounds were discussed from the results of cyclic voltammetry and surface analyses. The effect of ion implantation on the hydrogen absorption in palladium was also discussed. We pointed out the importance of studies of chemical and electrochemical properties of the novel compounds formed by the high dose ion implantation. ((orig.))