Published January 2010 | Version v1
Journal article

Characterization of ion emission of an extreme ultraviolet generating discharge produced Sn plasma

  • 1. Eindhoven University of Technology, Den Dolech 2, 5600 MB Eindhoven (Netherlands)
  • 2. ISAN Institute of Spectroscopy, Fizicheskaya Str. 5, Troitsk, Moscow Region 142190 (Russian Federation)
  • 3. ASML, De Run 6501, 5504 DR Veldhoven (Netherlands)
  • 4. Philips Research, High Tech Campus 4, 5656 AE Eindhoven (Netherlands)

Description

The ion emission of a Sn-based discharge produced extreme ultraviolet producing plasma is characterized with the combined use of different time-of-flight techniques. An electrostatic ion spectrometer is employed to measure the average charge distribution of the emitted Sn ions. A dedicated Faraday cup configuration is used to measure the total ion flux from the source for different discharge energies. High-energy Sn ions emitted by the plasma with energies up to 100 keV have been identified. The number of high-energy ions increases for higher electrical input energy into the plasma while the signal associated with the expanding plasma ions does not show such dependence. The ion energy distribution for a bulk of detected ions is calculated based on the Faraday cup measurements and compared with theoretical plasma expansion dynamics.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
107
Journal Issue
1
Journal Page Range
p. 013301-013301.7
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2010 American Institute of Physics