Published March 2019 | Version v1
Journal article

Self-templated synthesis of CoS2 hollow polyhedron with superior performance for removal of dye and heavy metal ion

  • 1. Laboratory of Dielectric Functional Materials, School of Physics and Material Science, Anhui University, Hefei 230601 (China)
  • 2. Institute of Physical Science and Information Technology, Anhui University, Hefei 230601 (China)

Description

Nanomaterials with hollow structures have been the focus of attention in recent years because of their widespread applications. In this article, we successfully developed an effective method to synthesize polyhedral CoS2 hollow nanostructure using ZIF-67 as the sacrificial template. When assessed as the adsorbents for fluorescein sodium and Pb(II) removal, the adsorption isotherm show a good fit with the Langmuir model, with the maximum adsorption capacities of 289 and 758 mg g−1, respectively. In addition, the as-prepared CoS2 also has a good recycling ability in the removal of fluorescein sodium dye, and the adsorption efficiency remains 98% after the four cycles. The superior performance for adsorption of dye and heavy metal ion make the polyhedral CoS2 hollow nanostructure have potential applications in water treatment.

Additional details

Identifiers

DOI
10.1016/j.jallcom.2018.10.210;
PII
S0925838818338842;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
776
Journal Page Range
p. 36-42
ISSN
0925-8388
CODEN
JALCEU

INIS

Country of Publication
Switzerland
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
55052720
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ADSORBENTS; ADSORPTION; ADSORPTION ISOTHERMS; FLUORESCEIN; HEAVY METALS; NANOMATERIALS; NANOSTRUCTURES; PERFORMANCE; RECYCLING; SODIUM; WATER TREATMENT
Descriptors DEC
ALKALI METALS; AROMATICS; CARBOXYLIC ACIDS; DYES; ELEMENTS; HYDROCARBONS; HYDROXY ACIDS; HYDROXY COMPOUNDS; ISOTHERMS; MATERIALS; METALS; ORGANIC ACIDS; ORGANIC COMPOUNDS; PHENOLS; POLYPHENOLS; SORPTION

Optional Information

Copyright
Copyright (c) 2018 Elsevier B.V. All rights reserved.