Filtered cathodic arc source
Description
A continuous, cathodic arc ion source coupled to a macro-particle filter capable of separation or elimination of macro-particles from the ion flux produced by cathodic arc discharge is described. The ion source employs an axial magnetic field on a cathode (target) having tapered sides to confine the arc, thereby providing high target material utilization. A bent magnetic field is used to guide the metal ions from the target to the part to be coated. The macro-particle filter consists of two straight solenoids, end to end, but placed at 45 degree to one another, which prevents line-of-sight from the arc spot on the target to the parts to be coated, yet provides a path for ions and electrons to flow, and includes a series of baffles for trapping the macro-particles. 3 figures
Availability note (English)
Available from Patent and Trademark Office, Box 9, Washington, DC 20232 (United States).Additional details
Publishing Information
- Imprint Pagination
- [10 p.].
- IPC:
- Int. Cl. C23C 14/32.
- IPC
- Int. Cl. C23C 14/32.
- Patent number
- US patent document 5,279,723/A/
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 25075202
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Resource subtype / Literary indicator
- Non-conventional Literature
- Descriptors DEI
- BAFFLES; DESIGN; ELECTRIC ARCS; ION SOURCES; PARTICLE SIZE
- Descriptors DEC
- CONTROL EQUIPMENT; CURRENTS; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; EQUIPMENT; FLOW REGULATORS; SIZE
Optional Information
- Secondary number(s)
- US patent application 7-921,780.