Published January 18, 1994 | Version v1
Patent

Filtered cathodic arc source

Description

A continuous, cathodic arc ion source coupled to a macro-particle filter capable of separation or elimination of macro-particles from the ion flux produced by cathodic arc discharge is described. The ion source employs an axial magnetic field on a cathode (target) having tapered sides to confine the arc, thereby providing high target material utilization. A bent magnetic field is used to guide the metal ions from the target to the part to be coated. The macro-particle filter consists of two straight solenoids, end to end, but placed at 45 degree to one another, which prevents line-of-sight from the arc spot on the target to the parts to be coated, yet provides a path for ions and electrons to flow, and includes a series of baffles for trapping the macro-particles. 3 figures

Availability note (English)

Available from Patent and Trademark Office, Box 9, Washington, DC 20232 (United States).

Additional details

Publishing Information

Imprint Pagination
[10 p.].
IPC:
Int. Cl. C23C 14/32.
IPC
Int. Cl. C23C 14/32.
Patent number
US patent document 5,279,723/A/

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
25075202
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
BAFFLES; DESIGN; ELECTRIC ARCS; ION SOURCES; PARTICLE SIZE
Descriptors DEC
CONTROL EQUIPMENT; CURRENTS; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; EQUIPMENT; FLOW REGULATORS; SIZE

Optional Information

Secondary number(s)
US patent application 7-921,780.