Published July 12, 2001
| Version v1
Journal article
Film growth using mass-separated ion beams
Creators
- 1. II. Physikalisches Institut, Universitaet Goettingen, Bunsenstrasse 7-9, D-37073 Goettingen (Germany)
Description
Mass-separated low energy ion beams provide clean, well defined, and controllable deposition conditions for film growth and are thus particularly suited to study basic mechanisms of thin film growth. The recent advances and emerging applications of mass-separated ion beam deposition (MSIBD) are discussed. During the last years MSIBD has been extensively applied to study the growth of tetrahedral amorphous carbon (ta-C) and cubic boron nitride (c-BN) films. The nucleation and growth conditions are discussed and compared with model predictions. The microstructure and properties of F-, B- and N- containing carbon films are briefly discussed
Additional details
Identifiers
- DOI
- 10.1063/1.1395460;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 576
- Journal Issue
- 1
- Journal Page Range
- p. 947-950
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- 16. international conference on the application of accelerators in research and industry
- Acronym
- CAARI 2000
- Dates
- 1-4 Nov 2000
- Place
- Denton, TX (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 35094343
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- AMORPHOUS STATE; BORON NITRIDES; CARBON; CRYSTAL GROWTH; CUBIC LATTICES; ION BEAMS; MICROSTRUCTURE; NUCLEATION; SURFACE COATING; TETRAGONAL LATTICES; THIN FILMS
- Descriptors DEC
- BEAMS; BORON COMPOUNDS; CRYSTAL LATTICES; CRYSTAL STRUCTURE; DEPOSITION; ELEMENTS; FILMS; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES
Optional Information
- Notes
- (c) 2001 American Institute of Physics.