Silicon doping in irradiation reactors
Creators
Description
CEA produces 10 % of the world production of irradiation-doped silicon in 2 research reactors (OSIRIS and ORPHEE) located in Saclay. Bars of silicon are installed in spinning irradiation devices behind neutron-absorbing screens in order to homogenize the neutron flux. In 2001 CEA provided the market with 8 tons of doped silicon, its maximal capacity was reached the year before with 11 tons. 3 Japanese (Shin-Etsu, Komatsu and Toshiba) and 1 Danish (Topsil) companies are among the customers of CEA, in 2001 CEA signed a partnership protocol with its Belgian counterpart (SCK-CEN) which disposes of irradiation facilities in Mol, according to this agreement CEA commits itself to direct its customers to SCK-CEN whenever it can not satisfy the demand and conversely for SCK-CEN. (A.C.)
Additional details
Additional titles
- Original title (French)
- Le dopage du silicium en flux tendu
Publishing Information
- Journal Title
- CEA Technologies (Gif-sur-Yvette)
- Journal Issue
- no.61
- Journal Page Range
- p. 6
- ISSN
- 1166-7648
INIS
- Country of Publication
- France
- Country of Input or Organization
- France
- INIS RN
- 33069472
- Subject category
- S07: ISOTOPES AND RADIATION SOURCES;
- Descriptors DEI
- CEA SACLAY; CRYSTAL DOPING; ION IMPLANTATION; IRRADIATION DEVICES; OSIRIS REACTOR; PERFORMANCE; PRODUCTION; SILICON
- Descriptors DEC
- CEA; ELEMENTS; ENRICHED URANIUM REACTORS; FRENCH ORGANIZATIONS; IRRADIATION REACTORS; MATERIALS TESTING REACTORS; NATIONAL ORGANIZATIONS; REACTORS; RESEARCH AND TEST REACTORS; RESEARCH REACTORS; SEMIMETALS; TANK TYPE REACTORS; THERMAL REACTORS; WATER COOLED REACTORS; WATER MODERATED REACTORS