Evolution of resistive switching mechanism through H2O2 sensing by using TaOx-based material in W/Al2O3/TaOx/TiN structure
Creators
- 1. Thin Film Nano Tech. Lab., Department of Electronics Engineering, Chang Gung University, 259 Wen-Hwa 1st Rd., Kwei-Shan, Tao-Yuan, 33302 (China)
Description
Highlights: • Simulated resistive switching mechanism is due to the change in oxidation states between Ta2+ and Ta5+. • The oxidation states are evidenced by X-ray photo-electron spectroscopy and H2O2 sensing. • Al2O3 layer restricts the formation of WOx layer, hence longer 108 program/erase cycles are achieved with 100 ns pulse width at current of 30 μA. • TaOx as a sensing membrane shows detection of H2O2 with a low concentration of 1 nM. Understanding of resistive switching mechanism through H2O2 sensing and improvement of switching characteristics by using TaOx-based material in W/Al2O3/TaOx/TiN structure have been reported for the first time. Existence of amorphous Al2O3/TaOx layer in the RRAM devices has been confirmed by transmission electron microscopy. By analyzing the oxidation states of Ta2+/Ta5+ for TaOx switching material and W0/W6+ for WOx layer at the W/TaOx interface through X-ray photoelectron spectroscopy and H2O2 sensing, the reduction-oxidation mechanism under Set/Reset occurs only in the TaOx layer for the W/Al2O3/TaOx/TiN structures. This leads to higher Schottky barrier height at the W/Al2O3 interface (0.54 eV vs. 0.46 eV), higher resistance ratio, and long program/erase endurance of >108 cycles with 100 ns pulse width at a low operation current of 30 μA. Stable retention of more than 104 s at 85 °C is also obtained. Using conduction mechanism and reduction-oxidation reaction, current-voltage characteristic has been simulated. Both TaOx and WOx membranes have high pH sensitivity values of 47.65 mV/pH and 49.25 mV/pH, respectively. Those membranes can also sense H2O2 with a low concentration of 1 nM in an electrolyte-insulator-semiconductor structure because of catalytic activity, while the Al2O3 membrane does not show sensing. The TaOx material in W/Al2O3/TaOx/TiN structure does not show only a path towards high dense, small size memory application with understanding of switching mechanism but also can be used for H2O2 sensors.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2017.10.072Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2017.10.072;
- PII
- S0169433217330052;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 433
- Journal Page Range
- p. 51-59
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 53026081
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM OXIDES; ELECTROLYTES; EQUIPMENT; LAYERS; MEMBRANES; OXIDATION; SENSITIVITY; SENSORS; SIMULATION; TITANIUM NITRIDES; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; CHEMICAL REACTIONS; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELEMENTS; METALS; MICROSCOPY; NITRIDES; NITROGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; PNICTIDES; REFRACTORY METALS; SPECTROSCOPY; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier B.V. All rights reserved.