Published October 25, 2006 | Version v1
Journal article

Investigation of electronic structure of Si nanocrystals and their interface with host matrix in P-doped SiO2:Si and Al2O3:Si nanocomposites

  • 1. Surface Phenomena Researches Group (SPRG), 9/23, 2nd Baumanskaya str., CNIICHERMET, 107005, Moscow (Russian Federation)

Description

The system of the nanoinclusions of Si in the SiO2 and Al2O3 matrix (SiO2:Si, Al2O3:Si) attracts great attention due to its ability of the luminescence in visible and near-IR range of spectrum. The influence of the P ion alloying on the electronic structure of nanocomposites was investigated. The P ion doping and post-annealed at T = 1000 deg. C (2 h) results in the enhancement of the photoluminescence (PL) peak connected with the Si nanocrystals. The electronic structure was investigated by X-ray photoelectron spectroscopy (XPS) and high-resolution electron energy losses spectroscopy (HREELS) methods. Ion surface modification and annealing forms the special nanostructure with Si nanocrystals in SiO2 and Al2O3 matrix having high density of interfaces with special atomic structure and various degree of oxidation of Si atoms on the boundaries. HREELS investigations show that the P ion doping increases the probability of interband transitions in SiO2:Si and Al2O3:Si composites

Additional details

Identifiers

DOI
10.1016/j.tsf.2005.12.181;
PII
S0040-6090(05)02511-3;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
515
Journal Issue
2
Journal Page Range
p. 591-595
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
8. international conference on atomically controlled surfaces, interfaces and nanostructures; ICTF-13: 13. international congress on thin films
Acronym
ACSIN-8
Dates
20-23 Jun 2005
Place
Stockholm (Sweden)

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.