Published October 2006 | Version v1
Journal article

P2 dimer implantation in silicon: A molecular dynamics study

  • 1. Centre for Quantum Computer Technology, School of Physics, University of Sydney, NSW 2006 (Australia)
  • 2. Centre of Excellence for Quantum Computer Technology, School of Physics, University of Melbourne, VIC 3010 (Australia)

Description

Using molecular dynamics simulations we investigate the influence of lattice-mediated vicinage effects in molecular P2 implantation events into silicon with energies in the low-keV range. We find that lattice-mediated vicinage effects are insignificant and hence that the dimer implantation can be closely approximated by two single-ion implantations a short distance apart. The simulations are applied to the technological problem of creating devices consisting of closely-spaced donors for the investigation of inter-donor coupling effects

Additional details

Identifiers

DOI
10.1016/j.nimb.2006.04.172;
PII
S0168-583X(06)00666-5;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
251
Journal Issue
2
Journal Page Range
p. 395-401
ISSN
0168-583X
CODEN
NIMBEU

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38040756
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
COMPUTERIZED SIMULATION; DIMERS; ION IMPLANTATION; IONS; KEV RANGE; MOLECULAR DYNAMICS METHOD; SILICON
Descriptors DEC
CALCULATION METHODS; CHARGED PARTICLES; ELEMENTS; ENERGY RANGE; SEMIMETALS; SIMULATION

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.