Published October 2006
| Version v1
Journal article
P2 dimer implantation in silicon: A molecular dynamics study
- 1. Centre for Quantum Computer Technology, School of Physics, University of Sydney, NSW 2006 (Australia)
- 2. Centre of Excellence for Quantum Computer Technology, School of Physics, University of Melbourne, VIC 3010 (Australia)
Description
Using molecular dynamics simulations we investigate the influence of lattice-mediated vicinage effects in molecular P2 implantation events into silicon with energies in the low-keV range. We find that lattice-mediated vicinage effects are insignificant and hence that the dimer implantation can be closely approximated by two single-ion implantations a short distance apart. The simulations are applied to the technological problem of creating devices consisting of closely-spaced donors for the investigation of inter-donor coupling effects
Additional details
Identifiers
- DOI
- 10.1016/j.nimb.2006.04.172;
- PII
- S0168-583X(06)00666-5;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 251
- Journal Issue
- 2
- Journal Page Range
- p. 395-401
- ISSN
- 0168-583X
- CODEN
- NIMBEU
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38040756
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- COMPUTERIZED SIMULATION; DIMERS; ION IMPLANTATION; IONS; KEV RANGE; MOLECULAR DYNAMICS METHOD; SILICON
- Descriptors DEC
- CALCULATION METHODS; CHARGED PARTICLES; ELEMENTS; ENERGY RANGE; SEMIMETALS; SIMULATION
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.