Published September 2017 | Version v1
Miscellaneous Open

Formation of thin silicon coatings by magnetron sputtering method

  • 1. Belarusian state university, Minsk (Belarus)
  • 2. Kazan federal university, Kazan (Russian Federation)

Description

The surface morphology and optical properties of Si coatings formed by magnetron sputtering were studied using atomic force microscopy and spectrophotometry methods. It has been found that the magnetron sputtering technological parameters (substrate temperature and bias potential) influence on the morphology of the silicon coatings surface (filamentous structures and/or round holes appearance) and on the coefficients minima and maxima reflectance and transmittance spectra location. (authors)

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Part of:
Interaction of radiation with solids. Proceedings of 12. International conference

Additional details

Additional titles

Original title (Russian)
Формирование оптически-прозрачных кремниевых покрытий методом магнетронного распыления

Publishing Information

Imprint Place
Minsk (Belarus)
ISBN
978-985-553-446-5
Imprint Title
Interaction of radiation with solids. Proceedings of 12. International conference
Imprint Pagination
483 p.
Journal Page Range
p. 329-330
Report number
INIS-BY--103

Conference

Title
12. International conference 'Interaction of radiation with solids'
Original Conference Title
12. Mezhdunarodnaya konferentsiya 'Vzaimodejstvie izluchenij s tverdym telom'
Dates
19-22 Sep 2017
Place
Minsk (Belarus)

Optional Information

Notes
2 refs., 1 tab., 2 figs. Imprint:Vzaimodejstvie izluchenij s tverdym telom. Materialy 12. Mezhdunarodnoj konferentsii