Cross-sectional TEM of Mo-Si multilayers for X-ray mirrors

Synthetically produced multilayer structures have made it possible to reflect photons of energies in the extreme ultra violet and soft X-ray regions. These reflectors have applications in synchrotron radiation sources as optical elements in beam line. The mirrors are fabricated by depositing alternate layers of a high atomic number and low atomic number materials, the choice of materials being depended on the wavelength to be used. The reflectivity of these multilayers strongly depends on the interface roughness. Through cross-sectional TEM it is possible to study the nature and roughness of interfaces in these multilayers. In the presentation sample preparation for cross-sectional TEM and the results found on these multilayers will be discussed. (author)