Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency

We have developed a cluster-eliminating filter which reduces amount of amorphous silicon nanoparticles (clusters) incorporated into a-Si:H films. We have measured film thickness dependence of a ratio of a hydrogen content associated with Si-H₂ bonds (C_SiH2) to that with Si-H bonds (C_SiH) as a parameter of the filter gap (d_gap). The cluster removal efficiency increases with decreasing d_gap. C_SiH2 and the ratio of C_SiH2 to C_SiH decrease with increasing the film thickness, suggesting the amount of incorporated clusters is high near the interface between the film and the substrate