Stress Measurement of Thin Film Oxide on The Zirconium Metal Using Steam Beam
Creators
- 1. Hanyang Univ., Seoul (Korea, Republic of)
- 2. Korea Atomic Energy Research Institute, Taejon (Korea, Republic of)
Description
It is well-known that tetragonal ZrO2 forms in the metal-oxide interface in the early stage of zirconium oxidation that is protective against further oxidation. However, as the oxide grows the stress built up during the oxidation process relieves then the tetragonal phase turns into the monoclinic phase which is non-protective and stable at low stress. Therefore, it is believed that the zirconium oxidation kinetics depends on the phase transformation that take place at 3.0 GPa according to the earlier works. In other words, if the transformation is related by holding the oxide stress above the threshold stress, the kinetics would be slow. Nevertheless, so far no one has succeeded to measure the stress of thin film oxide above 3.0 GPa. In this study, the stress has been measured using steam beam apparatus successfully above the threshold stress level
Additional details
Publishing Information
- Publisher
- KNS
- Imprint Place
- Taejon (Korea, Republic of)
- Imprint Title
- Proceedings of the KNS autumn meeting
- Imprint Pagination
- [1 CD-ROM]
- Journal Page Range
- [2 p.]
Conference
- Title
- 2005 autumn meeting of the KNS
- Dates
- 27-28 Oct 2005
- Place
- Busan (Korea, Republic of)
INIS
- Country of Publication
- Korea, Republic of
- Country of Input or Organization
- Korea, Republic of
- INIS RN
- 37072075
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference, Non-conventional Literature
- Descriptors DEI
- KINETICS; PHASE TRANSFORMATIONS; STEAM; STRESSES; THIN FILMS; ZIRCONIUM OXIDES
- Descriptors DEC
- CHALCOGENIDES; FILMS; OXIDES; OXYGEN COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; ZIRCONIUM COMPOUNDS
Optional Information
- Notes
- 10 refs, 2 figs