Production mechanism in an ECR-type multiply-charged ion source
- 1. Osaka Univ., Suita (Japan). Inst. of Scientific and Industrial Research
Description
A calculation model is proposed for the production of multiply-charged ions in an ECR plasma. Numerical calculations have been carried out using this model to estimate the charge state distribution of multiply-charged ions. It was expected that the K-shell ionization process or the charge exchange process would considerably affect the charge state distribution in the ECR plasma. Thus the charge state distributions of ions produced in the ECR plasma were measured as functions of gas pressure and input microwave power, and on comparing the measured and calculated distributions, it was recognized that K-shell ionization and charge exchange can not be neglected for a high input-power of about 1000 W and a high gas-pressure of 2.4 x 10-4 Torr. (author)
Additional details
Publishing Information
- Journal Title
- Jpn. J. Appl. Phys.
- Journal Volume
- 20
- Journal Issue
- 5
- Series
- Jpn. J. Appl. Phys.
- Journal Page Range
- 955-961
- ISSN
- 0021-4922
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 13681839
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Numerical Data
- Descriptors DEI
- ARGON; CHARGE EXCHANGE; ELECTRON CYCLOTRON-RESONANCE; EVALUATED DATA; GHZ RANGE 01-100; HIGH VACUUM; HOT PLASMA; ION DENSITY; ION SOURCES; IONIZATION; K SHELL; MATERIAL BALANCE; MATHEMATICAL MODELS; MULTICHARGED IONS; PLASMA PRODUCTION; RECOMBINATION; RF SYSTEMS
- Descriptors DEC
- CHARGED PARTICLES; CYCLOTRON RESONANCE; DATA; ELECTRONIC STRUCTURE; ELEMENTS; FREQUENCY RANGE; GHZ RANGE; INFORMATION; IONS; NONMETALS; NUMERICAL DATA; PLASMA; RARE GASES; RESONANCE