Annealing effects on the surface morphologies of thin PS/PMMA blend films with different film thickness
Creators
Description
The surface morphology evolution of three thin polystyrene (PS)/polymethyl methacrylate (PMMA) blend films (<70 nm) on SiOx substrates upon annealing were investigated by atomic force microscopy (AFM) and some interesting phenomena were observed. All the spin-coated PS/PMMA blend films were not in thermodynamic equilibrium. For the 67.1 and the 27.2 nm PS/PMMA blend films, owing to the low mobility of the PMMA-rich phase layer at substrate surfaces and interfacial stabilization caused by long-range van der Waals forces of the substrates, the long-lived metastable surface morphologies (the foam-like and the bicontinuous morphologies) were first observed. For the two-dimensional ultrathin PS/PMMA blend film (16.3 nm), the discrete domains of the PS-rich phases upon the PMMA-rich phase layer formed and the secondary phase separation occurred after a longer annealing time
Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2004.02.046;
- PII
- S0169433204001497;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 230
- Journal Issue
- 1-4
- Journal Page Range
- p. 115-124
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38091928
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; ATOMIC FORCE MICROSCOPY; FILMS; LAYERS; METHACRYLATES; MOBILITY; MORPHOLOGY; PMMA; POLYSTYRENE; SILICON OXIDES; STABILIZATION; SURFACES; VAN DER WAALS FORCES
- Descriptors DEC
- CARBOXYLIC ACID SALTS; CHALCOGENIDES; ESTERS; HEAT TREATMENTS; MATERIALS; MICROSCOPY; ORGANIC COMPOUNDS; ORGANIC POLYMERS; OXIDES; OXYGEN COMPOUNDS; PETROCHEMICALS; PETROLEUM PRODUCTS; PLASTICS; POLYACRYLATES; POLYMERS; POLYOLEFINS; POLYVINYLS; SILICON COMPOUNDS; SYNTHETIC MATERIALS
Optional Information
- Copyright
- Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.