Published November 1, 2017 | Version v1
Journal article

XPS Depth Profiling of Air-Oxidized Nanofilms of NbN on GaN Buffer-Layers

  • 1. National Research University "Moscow Power Engineering Institute", Moscow, 111250 (Russian Federation)
  • 2. Chalmers University of Technology, Göteborg, 41296 (Sweden)

Description

XPS depth chemical and phase profiling of an air-oxidized niobium nitride thin film on a buffer-layer GaN is performed. It is found that an intermediate layer of Nb5N6 and NbONx under the layer of niobium oxide is generated. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/917/9/092001

Additional details

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
917
Journal Issue
9
Journal Page Range
[6 p.]
ISSN
1742-6596

Conference

Title
4. International School and Conference on Optoelectronics, Photonics, Engineering and Nanostructures
Acronym
Saint Petersburg OPEN 2017
Dates
3-6 Apr 2017
Place
Saint-Petersburg (Russian Federation)