Published May 2006 | Version v1
Journal article

Time-resolved optical emission spectroscopy during pulsed dc magnetron sputter deposition of Ti and TiO2 thin films

  • 1. Department of Physics and Engineering Physics, Stevens Institute of Technology, Hoboken, NJ 07030 (United States)
  • 2. Center for Environmental Systems, Stevens Institute of Technology, Hoboken, NJ 07030 (United States)

Description

Time-resolved optical emission spectroscopy is applied to analyse pulsed dc magnetron plasmas during sputter deposition of Ti and TiO2 thin films. The studies are focused on the temporal behaviour of emissions of selected atomic titanium, argon and oxygen during the 'on-time', when the magnetron plasma source is turned on, and during the 'reverse-time', when the magnetron plasma source is turned off. Single and double exponential decays of the optical emissions were found during the 'reverse-time'. During the 'on-time', we observed a rapid increase in some emissions with a more or less pronounced overshoot and a slow increase in other emissions which follow the temporal evolution of the conduction current. The various time constants can be related to the dynamics of the fast electrons, the Ar metastables, the Ti atoms (metallic mode) and the O atoms (oxide mode)

Availability note (English)

Available online at http://stacks.iop.org/0963-0252/15/S17/psst6_2_S03.pdf or at the Web site for the journal Plasma Sources Science and Technology (ISSN 1361-6595) http://www.iop.org/

Additional details

Publishing Information

Journal Title
Plasma Sources Science and Technology
Journal Volume
15
Journal Issue
2
Journal Page Range
p. S17-S25
ISSN
0963-0252

Conference

Title
27. international conference on phenomena in ionized gases (ICPIG)
Dates
17-22 Jul 2005
Place
Eindhoven (Netherlands)