Pt diffusion driven L10 ordering in off-stoichiometric FePt thin films
Description
Pt/Fe3Pt thin films were deposited on the 〈100〉 silicon substrates at room temperature using DC sputtering. As-deposited Pt (25 nm)/Fe3Pt (70 nm) bilayers were subjected to heat treatment and a systematic study was carried out to investigate the structural and magnetic phase transition as a function of annealing temperature. The as-obtained films show an A1 disordered, face centered cubic phase which exhibit a magnetically soft behavior. After annealing at 300 °C for 1 h, the set in of L10 face centered tetragonal phase was observed and is attributed to the atomic diffusion at Pt/Fe3Pt interface. A coercivity of 6.8 kOe was obtained for Pt/Fe3Pt at 300 °C which increases to 12.5 kOe at 400 °C due to enhanced fct phase formation. Rutherford back scattering study has also been performed to investigate the inter-layer diffusion of Fe3Pt and Pt, along with estimation of film thickness and atomic composition with annealing temperature. The thickness and composition of films annealed at 600 °C was found to be 73 nm and Fe54Pt46, respectively. Lower temperature ordering is achieved for these bilayer films. - Highlights: • Lower temperature ordering achieved by using Pt/Fe3Pt bilayered structure. • Pt underlayer not only serves as a source for composition gradient but also reduces compressive stress which initiates low temperature ordering. • Interlayer diffusion as a function of annealing temperature is explained using Rutherford back scattering (RBS) technique. • A coercivity of 6.8 kOe was obtained after annealing at 300 °C for 1 h which increases to 12.5 kOe at 400 °C
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jmmm.2013.06.023Additional details
Identifiers
- DOI
- 10.1016/j.jmmm.2013.06.023;
- PII
- S0304-8853(13)00444-7;
Publishing Information
- Journal Title
- Journal of Magnetism and Magnetic Materials
- Journal Volume
- 345
- Journal Page Range
- p. 60-64
- ISSN
- 0304-8853
- CODEN
- JMMMDC
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45108558
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; BACKSCATTERING; COERCIVE FORCE; DEPOSITS; DIFFUSION; FCC LATTICES; PHASE TRANSFORMATIONS; SILICON; SPUTTERING; STRESSES; SUBSTRATES; THICKNESS; THIN FILMS
- Descriptors DEC
- CRYSTAL LATTICES; CRYSTAL STRUCTURE; CUBIC LATTICES; DIMENSIONS; ELEMENTS; FILMS; HEAT TREATMENTS; SCATTERING; SEMIMETALS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.