Published July 20, 2012 | Version v1
Journal article

Atomic force microscope cantilever calibration using a focused ion beam

  • 1. Smart Surface Structures Group, Flinders Centre for NanoScale Science and Technology, School of Chemical and Physical Sciences, Flinders University, Bedford Park South Australia, 5042 (Australia)

Description

A calibration method is presented for determining the spring constant of atomic force microscope (AFM) cantilevers, which is a modification of the established Cleveland added mass technique. A focused ion beam (FIB) is used to remove a well-defined volume from a cantilever with known density, substantially reducing the uncertainty usually present in the added mass method. The technique can be applied to any type of AFM cantilever; but for the lowest uncertainty it is best applied to silicon cantilevers with spring constants above 0.7 N m−1, where uncertainty is demonstrated to be typically between 7 and 10%. Despite the removal of mass from the cantilever, the calibration method presented does not impair the probes' ability to acquire data. The technique has been extensively tested in order to verify the underlying assumptions in the method. This method was compared to a number of other calibration methods and practical improvements to some of these techniques were developed, as well as important insights into the behavior of FIB modified cantilevers. These results will prove useful to research groups concerned with the application of microcantilevers to nanoscience, in particular for cases where maintaining pristine AFM tip condition is critical. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/23/28/285704

Additional details

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
23
Journal Issue
28
Journal Page Range
[14 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43104188
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
ATOMIC FORCE MICROSCOPY; CALIBRATION; ION BEAMS; MODIFICATIONS; NANOSTRUCTURES; PROBES; SILICON
Descriptors DEC
BEAMS; ELEMENTS; MICROSCOPY; SEMIMETALS