Published August 1, 2018 | Version v1
Journal article Metadata-only

The formation pathways of aqueous hydrogen peroxide in a plasma-liquid system with liquid as the cathode

Creators

  • 1. Institute of Electromagnetics and Acoustics, Fujian Provincial Key Laboratory of Plasma and Magnetic Resonance, Department of Electronic Science, Xiamen University, Xiamen 361005 (China)
  • 2. State Key Laboratory of Power Transmission Equipment and System Security and New Technology, Chongqing University, Chongqing 400044 (China)
  • 3. Key Laboratory of Special Function Materials and Structure Design of the Ministry of Education, and School of Physical Science and Technology, Lanzhou University, Lanzhou 730000 (China)
  • 4. Department of Materials Science and Engineering, College of Materials, Xiamen University, Xiamen 361005 (China)
  • 5. Department of Electrical and Computer Engineering, Duke University, Durham, NC 27708 (United States)

Description

Using an aqueous solution of NaCl as the cathode, we explored the atmospheric pressure Ar discharge plasma generated above the solution surface. The formation pathways of aqueous hydrogen peroxide (H2O2aq) in this system were investigated. Dimethyl sulfoxide was used as a scavenger of hydroxyl (OH) radicals to investigate the contribution of dissolved OH radicals to the H2O2aq. The results indicate that the H2O2aq is mainly formed by the combination of the dissolved OH radicals at the plasma-affected thin liquid layer, while the H2O2 formed in the gas phase and the H2O2aq formation inside water by the plasma-induced ultraviolet radiation have no contribution. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6595/aad66d

Additional details

Identifiers

DOI
10.1088/1361-6595/aad66d;

Publishing Information

Journal Title
Plasma Sources Science and Technology
Journal Volume
27
Journal Issue
8
Journal Page Range
[8 p.]
ISSN
0963-0252

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
52042163
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
AQUEOUS SOLUTIONS; ATMOSPHERIC PRESSURE; CATHODES; HYDROGEN PEROXIDE; HYDROXIDES; HYDROXYL RADICALS; LAYERS; PLASMA; ULTRAVIOLET RADIATION; WATER
Descriptors DEC
DISPERSIONS; ELECTRODES; ELECTROMAGNETIC RADIATION; HOMOGENEOUS MIXTURES; HYDROGEN COMPOUNDS; MIXTURES; OXYGEN COMPOUNDS; PEROXIDES; RADIATIONS; RADICALS; SOLUTIONS