Diffraction vacuum x-ray photoelectron spectrometer
Creators
- 1. Institute of Crystallography, Moscow (USSR)
Description
The high-vacuum x-ray spectrometer described is designed for the analysis of the structure of surface layers and the surface of crystalline solids by the method of standing x-ray waves. The basic part of the instrument consists of a set of monochromators with two crystals and a vacuum chamber (pressure ∼ 10-9 torr) with manipulators and an airlock. Inside the chamber are the goniometer for the sample, with a torsion drive than ensures backlash-free rotation in the angle range ∼ 10', and a system for the energy analysis of photoelectrons and Auger electrons. The drive permits operation with an ordinary x-ray tube or with a stationary high-power source, simultaneously recording the x-ray diffraction reflection and photoemission curves in the range of diffraction angles from 12 to 800.by
Additional details
Publishing Information
- Journal Title
- Instrum. Exp. Tech. (Engl. Transl.)
- Journal Volume
- 30
- Journal Issue
- 3
- Series
- Instrum. Exp. Tech. (Engl. Transl.).
- Journal Page Range
- 715-719
- ISSN
- 0020-4412
- CODEN
- INETA
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 19084777
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Resource subtype / Literary indicator
- Translation
- Descriptors DEI
- AUGER ELECTRON SPECTROSCOPY; CRYSTALS; DIFFRACTION GRATINGS; GONIOMETERS; MANIPULATORS; MONOCHROMATORS; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; SAMPLE HOLDERS; SEMICONDUCTOR MATERIALS; SENSITIVITY; STANDING WAVES; VACUUM SYSTEMS; X-RAY DIFFRACTION; X-RAY SPECTROMETERS; X-RAY SPECTROSCOPY
- Descriptors DEC
- COHERENT SCATTERING; DIFFRACTION; ELECTRON SPECTROSCOPY; EMISSION; EQUIPMENT; LABORATORY EQUIPMENT; MATERIALS; MATERIALS HANDLING EQUIPMENT; MEASURING INSTRUMENTS; REMOTE HANDLING EQUIPMENT; SCATTERING; SECONDARY EMISSION; SPECTROMETERS; SPECTROSCOPY
Optional Information
- Notes
- Translated from Prib. Tekh. Eksp.; 30: No. 3, 191-195(May-Jun 1987).