Published June 3, 2005 | Version v1
Journal article

Selected Growth of Cubic and Hexagonal GaN Epitaxial Films on Polar MgO(111)

  • 1. Department of Physics and Laboratory for Surface Studies, University of Wisconsin-Milwaukee, P.O. Box 413, Milwaukee, Wisconsin 53201 (United States)

Description

Selected molecular beam epitaxy of zinc blende (111) or wurtzite (0001) GaN films on polar MgO(111) is achieved depending on whether N or Ga is deposited first. The cubic stacking is enabled by nitrogen-induced polar surface stabilization, which yields a metallic MgO(111)-(1x1)-ON surface. High-resolution transmission electron microscopy and density functional theory studies indicate that the atomically abrupt semiconducting GaN(111)/MgO(111) interface has a Mg-O-N-Ga stacking, where the N atom is bonded to O at a top site. This specific atomic arrangement at the interface allows the cubic stacking to more effectively screen the substrate and film electric dipole moment than the hexagonal stacking, thus stabilizing the zinc blende phase even though the wurtzite phase is the ground state in the bulk

Additional details

Publishing Information

Journal Title
Physical Review Letters
Journal Volume
94
Journal Issue
21
Journal Page Range
p. 216101-216101.4
ISSN
0031-9007
CODEN
PRLTAO

Optional Information

Notes
(c) 2005 The American Physical Society