Published September 2007
| Version v1
Journal article
Room temperature deposition of magnetite thin films on organic substrate
- 1. Istituto per lo Studio dei Materiali Nanostrutturati ISMN Bologna, via Gobetti 101, 40129 Bologna (Italy)
Description
We report on the growth of magnetite films directly on thin layers of organic semiconductors by means of an electron beam ablation method. The deposition was performed at room temperature in a reactive plasma atmosphere. Thin films show ferromagnetic (FM) hysteresis loops and coercive fields of hundreds of Oersted. Micro Raman analysis indicates no presence of spurious phases. The morphology of the magnetite film is strongly influenced by the morphology of the underlayer of the organic semiconductor. These results open the way for the application of magnetite thin films in the field of organic spintronics
Additional details
Identifiers
- DOI
- 10.1016/j.jmmm.2007.03.056;
- PII
- S0304-8853(07)00390-3;
Publishing Information
- Journal Title
- Journal of Magnetism and Magnetic Materials
- Journal Volume
- 316
- Journal Issue
- 2
- Journal Page Range
- p. 410-412
- ISSN
- 0304-8853
- CODEN
- JMMMDC
Conference
- Title
- Joint European magnetic symposia
- Dates
- 26-30 Jun 2006
- Place
- San Sebastian (Spain)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39035528
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABLATION; DEPOSITION; ELECTRON BEAMS; FERROMAGNETIC MATERIALS; HYSTERESIS; MAGNETITE; MORPHOLOGY; ORGANIC SEMICONDUCTORS; OXIDES; PLASMA; TEMPERATURE RANGE 0273-0400 K; THIN FILMS
- Descriptors DEC
- BEAMS; CHALCOGENIDES; FILMS; IRON ORES; LEPTON BEAMS; MAGNETIC MATERIALS; MATERIALS; MINERALS; ORES; OXIDE MINERALS; OXYGEN COMPOUNDS; PARTICLE BEAMS; SEMICONDUCTOR MATERIALS; TEMPERATURE RANGE
Optional Information
- Copyright
- Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.